A Comparison of High-Impulse and Direct-Current Magnetron Sputtering Processes for the Formation of Effective

Joanna Kacprzyńska-Gołacka1, Piotr Wieciński2,3, Bogusława Adamczyk-Cieślak3

  • 1Łukasiewicz Research Network-Institute for Sustainable Technologies, 26-600 Radom, Poland.

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