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Updated: Jan 14, 2026

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Jörg Schörmann1, Mario F Zscherp1, Silas A Jentsch1
1Institute of Experimental Physics I and Center for Materials Research, Justus-Liebig-University Giessen, Giessen D-35392, Germany.
Aluminum Scandium Nitride (AlScN) pseudosubstrates improve lattice matching for Indium Gallium Nitride (InGaN) growth. This breakthrough enables high-quality InGaN films, paving the way for efficient red micro-light-emitting diode (micro-LED) devices.
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