Preparation and Reactions of Sulfides
MOS Capacitor
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Updated: May 5, 2026

Fabrication of Spatially Confined Complex Oxides
Published on: July 1, 2013
Mingyang Wang1, Taoyu Zou2, Youjin Reo2
1Institute of Fundamental and Frontier Sciences, State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 611731, China.
A novel sulfur-mediated strategy enables the formation of tellurium-based oxide conduction channels for high-performance amorphous p-type thin-film transistors. This breakthrough allows for ultralow-temperature processing, crucial for flexible electronics and complementary metal-oxide semiconductor (CMOS) technologies.
08:50Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
12:32The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
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