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Updated: Apr 6, 2026

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Tianbi Zhang1, Jakub Holzer2, Tomáš Vystavěl2
1Department of Materials Engineering, University of British Columbia, 309-6350 Stores Road, Vancouver, V6T 1Z4 BC, Canada.
Reflection Kikuchi diffraction (RKD) combined with multivariate statistical methods (MSA) effectively characterizes thin films and 2D materials like WSe2. This technique simultaneously assesses thickness and crystallographic orientation, crucial for optimizing device performance.
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