Ferromagnetism
Biasing of FET
Biasing of Metal-Semiconductor Junctions
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Updated: Jan 6, 2026

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Jong-Hyun Kim1, Seung-Hwan Kim2, Hyeong-Kyu Jin3
1Department of Semiconductor Systems Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul, 02841, South Korea.
Ferroelectric semiconductor field-effect transistors (FeS-FETs) using α-In2Se3 show performance variations due to crystal anisotropy. Optimizing source/drain contact alignment along the armchair direction significantly enhances memory device performance.
10:40A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
09:06Visualizing Uniaxial-strain Manipulation of Antiferromagnetic Domains in Fe1+YTe Using a Spin-polarized Scanning Tunneling Microscope
Published on: March 24, 2019
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