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Rotating compensator spectroscopic ellipsometry based on frequency division multiplexing with retardation

Jongkyoon Park1, Alexander Gliserin2, Sukhyun Choi3

  • 1Semiconductor and Display Metrology Group, Korea Research Institute of Standards and Science, 267 Gajeongno, Yuseong-Gu, Daejeon, 34113, South Korea. qkrwhdrbs@kriss.re.kr.

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Frequency Division Multiplexing Rotating Compensator Spectroscopic Ellipsometry (FDM-RCSE) allows simultaneous multi-wavelength measurement of optical properties. This novel spectroscopic ellipsometry technique offers comprehensive material characterization with high accuracy.

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Area of Science:

  • Materials Science
  • Optical Physics
  • Metrology

Background:

  • Spectroscopic ellipsometry (SE) is crucial for non-destructive material characterization, including optical constants and film thickness.
  • Existing SE techniques have limitations in simultaneous multi-wavelength analysis and comprehensive property extraction.

Purpose of the Study:

  • To theoretically and experimentally demonstrate a novel Frequency Division Multiplexing Rotating Compensator Spectroscopic Ellipsometry (FDM-RCSE) technique.
  • To enable simultaneous measurement of multiple ellipsometry transfer quantities (ETQ) at various wavelengths.

Main Methods:

  • Utilized frequency division multiplexing (FDM) with a rotating compensator and retardation calibration.
  • Employed lasers with multiple wavelengths and a spectrally integrating detector for simultaneous ETQ acquisition.
  • Compared FDM-RCSE measurements with a commercial SE instrument for performance evaluation.

Main Results:

  • FDM-RCSE successfully measured SiO2 film thicknesses on Si wafers with an average difference of less than 2 Å compared to commercial SE.
  • Achieved high measurement reproducibility and enabled extraction of more comprehensive optical properties like depolarization.
  • Demonstrated simultaneous measurement of three ETQs at multiple wavelengths without spectral analysis or wavelength switching.

Conclusions:

  • The FDM technique is effectively applicable to ellipsometry with compensators and retardation calibration.
  • FDM-RCSE provides a versatile alternative for advanced optical material characterization.
  • This method enhances SE capabilities for detailed analysis of material properties.