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LTP-corrected stitching interferometer achieving sub-nanometer accuracy for x-ray mirror metrology.

Yanghui Wang1, Shuai Zhao1, Huiyun Wang2

  • 1National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China.

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|December 3, 2025
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Summary

This study introduces a novel stitching interferometry system for precise measurement of large curved x-ray mirrors. It achieves sub-nanometer accuracy by correcting angular errors, crucial for advanced optics metrology.

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Area of Science:

  • Optics and Metrology
  • Surface characterization
  • X-ray optics

Background:

  • Accurate metrology of large curved x-ray mirrors is essential for advanced scientific instruments.
  • Traditional stitching interferometry methods struggle with cumulative angular errors for large optics.
  • Sub-nanometer accuracy is required for next-generation synchrotron and x-ray applications.

Purpose of the Study:

  • To develop and validate a sub-nanometer accuracy stitching interferometry system for large curved x-ray mirrors.
  • To overcome limitations of existing metrology techniques, particularly angular error propagation.
  • To enable high-precision characterization of complex optical surfaces.

Main Methods:

  • Employed a Fizeau interferometer with a reference transmission flat for sub-aperture measurements.
  • Implemented a mixed stitching method combined with Long Trace Profiler (LTP) low-frequency correction.
  • Developed a correction strategy to mitigate cumulative angular errors during stitching.

Main Results:

  • Achieved 0.18 nm RMS measurement repeatability on high-precision optics.
  • Demonstrated excellent agreement (<0.2 nm RMS) with direct LTP measurements.
  • Successfully verified curved mirror metrology with <1% radius error and characterized synchrotron mirrors with high accuracy.

Conclusions:

  • The developed stitching interferometry system achieves sub-nanometer accuracy for large curved x-ray mirrors.
  • LTP-guided correction effectively eliminates angular drift propagation, surpassing software-only methods.
  • This metrology system is vital for the fabrication and qualification of advanced x-ray optics.