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Updated: Jan 9, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
DFT coupled with NEGF study of N-type MOSFET based on 2D Bi2C3semiconductor
Yongjun Huang1, Jialin Yang1, Weicong Sun1
1Key Laboratory of Advanced Display Materials and Devices, Ministry of Industry and Information Technology, College of Material Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China.
Two-dimensional bismuth carbide (Bi2C3) shows promise for future electronics. This novel semiconductor exhibits excellent performance metrics, meeting International Technology Roadmap for Semiconductors targets for high-performance integrated circuits.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Silicon-based Field-Effect Transistors (FETs) are approaching fundamental scaling limits.
- Two-dimensional (2D) materials offer potential solutions to overcome short-channel effects and reduce power consumption in advanced transistors.
- Novel 2D materials are continuously being explored for next-generation semiconductor devices.
Purpose of the Study:
- To comprehensively investigate the electronic and transport properties of the novel 2D bismuth carbide (Bi2C3) semiconductor.
- To evaluate the potential of monolayer Bi2C3 as a channel material for high-performance Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs).
- To assess the device performance against the International Technology Roadmap for Semiconductors (ITRS) specifications.
Main Methods:
- First-principles density functional theory (DFT) calculations were employed to determine the electronic band structure of monolayer Bi2C3.
- Non-equilibrium Green's function (NEGF) quantum transport simulations were utilized to model the performance of Bi2C3-based FETs.
- Device simulations were conducted for various channel lengths, including 10 nm and 5 nm.
Main Results:
- Monolayer Bi2C3 exhibits a moderate direct bandgap, a sharp conduction band, and a low electron effective mass (0.48m0).
- Bi2C3 FETs achieved an ultra-high on-state current (Ion) of 2540 μA/μm with an on/off ratio exceeding 10^4 for a 10 nm channel.
- Devices demonstrated fast switching speeds, low power-delay (τ), and excellent energy-delay product, meeting ITRS high-performance targets across scaled channel lengths.
Conclusions:
- Monolayer Bi2C3 is a highly competitive candidate material for future high-performance integrated circuits.
- The comprehensive performance metrics of Bi2C3-based FETs satisfy critical requirements for advanced semiconductor applications.
- This study provides the first systematic evaluation of Bi2C3's potential in MOSFETs using DFT-NEGF simulations.
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