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Related Experiment Video

Updated: Jan 9, 2026

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres

Published on: December 1, 2014

A High-Efficiency Environmentally Friendly Polishing Slurry for K9 Glass Utilizing Cerium-Based Compounds.

Shaoping Li^1,2,3, Rui Ye², Zhemin Zou²

¹School of Resources and Safety Engineering, Wuhan Institute of Technology, 693 Xiongchu Avenue, Wuhan 430073, China.

Molecules (Basel, Switzerland)

|December 11, 2025

Summary

A new environmentally friendly polishing slurry significantly improves K9 glass chemical mechanical polishing (CMP). The optimized slurry, containing cerium oxide, aluminum oxide, guanidine carbonate, and a surfactant, achieved a 7x higher material removal rate and superior surface finish.

Keywords:

K9 glass chemical mechanical polishing guanidine carbonate mixed abrasive sodium lauryl-6 carboxylate

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TiO2-coated Hollow Glass Microspheres with Superhydrophobic and High IR-reflective Properties Synthesized by a Soft-chemistry Method

Published on: April 26, 2017

Area of Science:

Materials Science
Chemical Engineering
Optical Engineering

Background:

K9 glass is crucial for high-precision optics but challenging to polish due to its hardness and brittleness.
Existing chemical mechanical polishing (CMP) methods struggle to meet stringent surface finish and subsurface damage requirements for K9 glass.

Purpose of the Study:

To develop a novel, high-performance, and environmentally friendly CMP slurry for K9 glass.
To investigate the synergistic effects of cerium oxide, aluminum oxide, guanidine carbonate, and a surfactant on K9 glass polishing.

Main Methods:

Formulation of a novel polishing slurry with cerium oxide (CeO2), aluminum oxide (Al2O3), guanidine carbonate (GC), and sodium laureth-6 carboxylate (SL-6C).
Optimization of slurry composition (1 wt% CeO2, 0.05 wt% Al2O3, 0.2 wt% GC, 0.2 wt% SL-6C).
Evaluation of polishing performance through material removal rate (MRR) and surface roughness measurements.

Main Results:

The optimized slurry achieved a K9 glass surface roughness as low as 0.11 nm.
The material removal rate (MRR) reached 521.71 nm/min, a seven-fold increase compared to CeO2-only slurries.
Aluminum oxide enhanced mechanical friction, guanidine carbonate promoted hydration, and the surfactant improved dispersion and lubrication.

Conclusions:

The synergistic interactions within the novel slurry formulation significantly enhance CMP efficiency and surface quality for K9 glass.
This research provides valuable insights for developing advanced CMP slurries for demanding optical applications.
The developed slurry offers a high-performance, eco-friendly solution for precision optical component fabrication.