Harnessing RAFT Polymerization for Hierarchical Structuring of Thermosets by Direct Ink Writing.

Area of Science:

• Materials Science
• Polymer Chemistry
• Additive Manufacturing

Background:

• Integrating molecular self-assembly with additive manufacturing enables direct production of thermosetting polymers with intricate geometries.
• Diverse applications exist for these materials, including nanostructured porous materials, solid polymer electrolytes, and inorganic composites.

Purpose of the Study:

• To develop photocurable polymeric inks with precisely controlled nanostructures for direct ink writing (DIW).
• To investigate the preservation of nanostructures and mechanical enhancement through covalent anchoring during photocuring.

Main Methods:

• Synthesized amphiphilic block copolymers (BCPs) via reversible addition-fragmentation chain-transfer (RAFT) polymerization.
• Combined BCPs with a crosslinker/selective solvent to create stable, nanostructured inks.
• Utilized direct ink writing (DIW) and photocuring to fabricate hierarchical thermosetting materials.

Main Results:

• The developed inks exhibited stable, well-ordered nanostructures that were largely preserved after photocuring.
• Covalent anchoring of nanodomains to the matrix improved nanoscale morphology retention and mechanical performance.
• The inks displayed shear-thinning behavior with rapid structural recovery, enabling high-fidelity DIW.

Conclusions:

• A novel strategy for fabricating hierarchical thermosetting materials using photocurable inks and DIW was established.
• This approach allows for precise control over material architecture and enhanced functionalities under ambient conditions.
• The method broadens possibilities for designing advanced thermosetting materials without complex processing steps.