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A 3D energy deposition model guided by resist activation energy for helium ion beam lithography at its resolution

Yunsheng Deng1, Shiyang Gao2,3, Jingfu Xu2,3

  • 1Pico Center and SUSTech Core Research Facilities, Southern University of Science and Technology, Shenzhen 518055, People's Republic of China.

Nanotechnology
|January 13, 2026
PubMed

Keywords:
activation energyhelium ion beamlithographyproximity effectresolution limitroughnesssimulation

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