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Updated: Apr 27, 2026

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Atomically Traceable Nanostructure Fabrication
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Retraction of "N2/H2 Plasma-Enhanced Atomic Layer Deposition for SiO2 Gap Filling: Implications for Nanoelectronics
Abstract:
[This retracts the article DOI: 10.1021/acsanm.4c06844.].
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