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Updated: Jan 24, 2026

Residue-Free Fabrication of van der Waals Heterostructures of Two-Dimensional Materials
Published on: July 18, 2025
Gradual Band Evolution at the Electron-Correlated Interface in a Laterally Hetero-Epitaxial Two-Dimensional
Xiang Ren1, Shihao Hu1, Genyu Hu1
1Center for Interdisciplinary Science of Optical Quantum and NEMS Integration, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Advanced Research Institute of Multidisciplinary Sciences, and School of Integrated Circuits and Electronics, Beijing Institute of Technology, Beijing 100081, China.
Abstract:
As a fundamental characteristic, interfacial band evolution exerts a profound impact on the performance of heterostructures, especially the two-dimensional (2D) lateral heterostructure, which is anticipated with its excellent interfacial properties. Despite intensive reports on semiconductors, studies on 2D electron-correlated heterostructures, which hold big expectations for quantum devices, remain in their early stages on limited materials, hindered by the lack of a controllable fabrication strategy. Here, we report the laterally epitaxial fabrication of the 1T-NbSe2/1T-VSe2 heterostructure and the visualization of the band evolution at its electron-correlated interface. With designed parameters, the 2D VSe2 was successfully grown adjacent to the presynthesized 1T-NbSe2. Atomic-resolution characterizations reveal a well-aligned atomic lattice at the interface. A continuous band profile, particularly the gentle interfacial evolution of the Mott-Hubbard bands, was visualized at the interface, showing the gradual band bending of the upper Hubbard band (∼0.026 eV) and a shrinkage of the Mott-Hubbard gap from 0.124 eV with a decay length of ∼2.4 nm. Our work offers an essential strategy for the fabrication and visualization of 2D electron-correlated heterostructures, laying the groundwork for their fundamental study and future applications.
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