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Time-Domain Simulation and Optimization of the Memory Window for HZO-Based FeFETs Using the NLS Model
Shangda Han1, Weifeng Lü1,2, Yekun Liang3
1School of Electronic Information, Hangzhou Dianzi University, Hangzhou 310018, China.
This study introduces a novel time-domain simulation framework for Hafnium-zirconium oxide (HZO) ferroelectric field-effect transistors (FeFETs). This approach enables efficient, end-to-end simulation and optimization for advanced memory applications.
Area of Science:
- Materials Science
- Electrical Engineering
- Computational Physics
Background:
- Hafnium-zirconium oxide (HZO)-based ferroelectric field-effect transistors (FeFETs) are crucial for next-generation embedded memory and compute-in-memory systems.
- Current TCAD simulations are computationally intensive and do not fully capture dynamic ferroelectric domain switching, limiting device development.
Purpose of the Study:
- To develop a computationally efficient time-domain simulation framework for HZO FeFETs.
- To enable self-consistent simulation of polarization and electrical characteristics, including device variability and process optimization.
- To provide model-based support for the design of advanced, ultra-low-power FeFETs.
Main Methods:
- A time-domain simulation framework coupling the nucleation-limited switching (NLS) model with MOSFET surface potential for self-consistent solutions.
- Monte Carlo methods to simulate device variability and Shmoo plots for process window identification.
- An integrated solution for 22 nm FDSOI devices, including geometric scaling and modified Landau-Khalatnikov (L-K) dynamics for ultrathin ferroelectrics.
Main Results:
- The framework enables end-to-end simulation from material polarization to device electrical characteristics and performance optimization.
- Successfully addressed geometric scaling, ultrathin ferroelectric layer dynamics, and short-channel effects in 22 nm FDSOI devices.
- Demonstrated potential for analytical and design support in developing advanced FeFETs.
Conclusions:
- The developed time-domain simulation framework offers a significant advancement over traditional TCAD for HZO FeFETs.
- This approach facilitates efficient exploration of design spaces and optimization of programming/erasure windows.
- The study provides a robust tool for accelerating the development of ultra-low-power FeFETs for memory and computing applications.
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