Time-Domain Simulation and Optimization of the Memory Window for HZO-Based FeFETs Using the NLS Model

Shangda Han1, Weifeng Lü1,2, Yekun Liang3

  • 1School of Electronic Information, Hangzhou Dianzi University, Hangzhou 310018, China.

Micromachines
|July 28, 2026
PubMed
Summary

This study introduces a novel time-domain simulation framework for Hafnium-zirconium oxide (HZO) ferroelectric field-effect transistors (FeFETs). This approach enables efficient, end-to-end simulation and optimization for advanced memory applications.

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