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Simulation, Fabrication and Characterization of THz Metamaterial Absorbers
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Nanoforest-like Metamaterials for VIS-IR Dual-Band Camouflage
Zhiqi Zhai1, Ni Zhang1, Xiaoyi She1
1State Key Laboratory of Optoelectronic Materials and Technologies, School of Materials Science and Engineering, Sun Yat-sen University, Guangzhou 510275, China.
ACS Applied Materials & Interfaces
|January 23, 2026
Summary
A novel silver-deposited silicon nanoforest metamaterial provides effective visible-infrared dual-band camouflage. This technology enhances absorptivity and reflectivity for advanced military stealth and thermal management applications.
Area of Science:
- Materials Science and Engineering
- Nanotechnology
- Optics and Photonics
Background:
- Conventional single-band camouflage is insufficient against advanced multispectral detection.
- Need for materials offering simultaneous control over visible and infrared spectrum properties.
Purpose of the Study:
- To propose and demonstrate a visible-infrared (VIS-IR) dual-band compatible metamaterial for camouflage.
- To achieve high absorptivity in the visible and shortwave near-infrared (SNIR) spectrum.
- To ensure high reflectivity in the mid/long-wave infrared (MWIR/LWIR) atmospheric windows.
Main Methods:
- Fabrication of silver-deposited silicon nanoforest (AgSNF) metamaterial using reactive ion etching (RIE) and magnetron sputtering.
- Characterization of AgSNF properties through simulations and experimental measurements.
- Analysis of absorptivity and reflectivity across VIS, SNIR, MWIR, and LWIR spectra.
Main Results:
- AgSNF exhibits high VIS (up to 0.969) and SNIR (up to 0.936) absorptivity due to multiple and Mie scattering from Si nanopillars.
- Backside silver film (≥ 40 nm) achieves high MWIR (0.733) and LWIR (0.595) reflectivity.
- Demonstrated reduction in apparent radiation temperature from 65 °C to 42.1 °C.
Conclusions:
- The AgSNF metamaterial offers effective VIS-IR dual-band compatible camouflage.
- Fabrication is scalable, cost-effective, and avoids complex photolithography.
- Promising potential for military stealth and radiative thermal management.
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