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Smooth Critical Dimension Compensation Across Photomask Transmittance Discontinuities Enabled by Selective and Direct

Dabin Park1, Geumsu Yeom1, Sungho Jeong2

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Summary

Laser patterning inside photomasks corrects critical-dimension non-uniformity in large-area lithography. This technique precisely controls photomask transmittance, ensuring smooth critical-dimension behavior even with abrupt changes.

Keywords:
critical dimension non-uniformityphotolithography overexposurephotomask transmittanceselective laser patterning

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Area of Science:

  • Photolithography
  • Materials Science
  • Optical Engineering

Background:

  • Large-area lithography systems with segmented illumination can suffer from critical-dimension (CD) non-uniformity due to overexposure.
  • Existing methods for CD control may lack precision or practicality for complex lithography setups.

Purpose of the Study:

  • To investigate a selective laser patterning technique applied inside photomasks to mitigate CD non-uniformity.
  • To analyze the impact of laser patterning on photomask transmittance and its effect on CD control.

Main Methods:

  • Selective laser patterning was applied to photomasks to create controlled voids.
  • Geometric characteristics of laser-induced voids were analyzed under varying laser conditions.
  • Photomask transmittance was modulated by adjusting laser parameters, void density, pattern arrangement, and layering.
  • CD behavior was evaluated across regions with different transmittance levels, including abrupt transitions.

Main Results:

  • Void size and morphology were tunable via laser pulse energy, with defined processing windows to prevent mask fracture.
  • Photomask transmittance was precisely controlled from 20% to 92% using laser patterning.
  • CD compensation was achieved with nanometer- to tens-of-nanometer precision.
  • Smooth CD variation was observed across abrupt transmittance boundaries (e.g., 80% to 50%), preventing sharp CD shifts.

Conclusions:

  • Selective laser patterning inside photomasks is a practical and effective method for CD compensation.
  • This technique successfully mitigates CD non-uniformity in large-area lithography with segmented illumination.
  • The ability to precisely control photomask transmittance enables robust CD control, even in challenging lithographic scenarios.