Related Experiment Video
Updated: Jan 29, 2026

Making Record-efficiency SnS Solar Cells by Thermal Evaporation and Atomic Layer Deposition
Published on: May 22, 2015
Ruthenium(II) carbonyl amidates - a new class of precursors for atomic layer deposition
Jorit Obenlüneschloß1, Cara-Lena Nies2, Michael Gock3
1Inorganic Materials Chemistry, Ruhr University Bochum, Bochum, 44801 Germany. a.devi@ifw-dresden.de.
None:
Ru-based thin films are essential for electronics and catalysis. Their growth through atomic layer deposition (ALD) depends on precursors that balance reactivity, volatility, and thermal stability. We present the first Ru dicarbonyl bisamidate complexes as a new and promising class of ALD precursors for Ru-based materials. Modifying the substitution pattern of the amidate ligands yielded [Ru(CO)2(N-sBuiPrAD)2], as a volatile liquid precursor with excellent thermal properties. First principles simulations predict favorable interactions with common ALD co-reactants, indicating its potential for thin film deposition.
Related Concept Videos
Preparation of Amides
The DCC-promoted synthesis of amides begins with the protonation of DCC by carboxylic acid. The protonation makes it a better acceptor. Next, the addition of carboxylate to the protonated carbodiimide gives a reactive acylating agent.
Subsequently, the amine acts as a nucleophile that attacks the acylating agent to form a tetrahedral intermediate. In the...
Atomic Structure
Atomic Mass
Atomic Orbitals
Hybridization of Atomic Orbitals I
Nucleophilic Addition to the Carbonyl Group: General Mechanism
A stronger nucleophile can directly attack the electrophilic center, the carbonyl carbon. The HOMO orbital of the nucleophile interacts with the LUMO (π* antibonding) orbital present on the carbonyl carbon. This interaction breaks the π bond and shifts the π...

