Defect Characterization of the SiO₂/Si Interface Investigated by Drift-Assisted Positron Annihilation Lifetime...

This study demonstrates drift-assisted positron annihilation lifetime spectroscopy on a p-type (100) silicon substrate in a MOS capacitor, using an applied electric field to control the spatial positron distribution prior to annihilation. The device was operated under accumulation, depletion, and inversion conditions, revealing that the internal electric field can drift-transport positrons either toward or away from the SiO₂/Si interface, acting as a diffusion barrier or support, respectively. Key positron drift-transport parameters were derived from lifetime data, and the influence of the non-linear electric field on positron trapping was analyzed. The comparison of the presented results to our previous oxide-side drift experiment on the same metal-oxide-silicon capacitor indicates that the interface exhibits two distinct sides, with different types of defects: void-like and vacancy-like (Pb centers). The positron data also suggest that the charge state of the Pb centers likely varies with the operation mode of the MOS, which affects their positron trapping behavior.