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Related Concept Videos

Arc Length Function01:22

Arc Length Function

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The arc length function represents the total distance traveled along a smooth curve measured from a fixed starting point to a variable endpoint. For curves that are continuous and differentiable, arc length provides a precise way to quantify distance when straight-line approximations are insufficient.To derive arc length, the curve is divided into many small segments. Each segment is approximated by a straight line whose length depends on the horizontal and vertical changes over that interval.
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Arc Length of a Curve: Problem Solving01:21

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A high-voltage power line spans a 40-meter horizontal distance between two transmission towers, resulting in a 10-meter vertical sag due to the effects of gravity and thermal expansion. The curve formed by the suspended cable is a catenary, which accurately models the behavior of a uniform, flexible cable under its own weight. Unlike a parabolic shape, the catenary is described by the hyperbolic cosine function and offers a precise representation of the cable's form.In this setup, engineers...
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Passive filters are utilized to shape the frequency spectrum of signals across a diverse array of applications. These filters, using only passive elements like resistors (R), inductors (L), and capacitors (C), are capable of selectively allowing or blocking certain frequency ranges without the need for external power sources.
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Some solids can transition directly into the gaseous state, bypassing the liquid state, via a process known as sublimation. At room temperature and standard pressure, a piece of dry ice (solid CO2) sublimes, appearing to gradually disappear without ever forming any liquid. Snow and ice sublimate at temperatures below the melting point of water, a slow process that may be accelerated by winds and the reduced atmospheric pressures at high altitudes. When solid iodine is warmed, the solid sublimes...
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Updated: Feb 14, 2026

Development of Efficient OLEDs from Solution Deposition
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Filtered Cathodic Vacuum Arc Deposition for Inkjet-Printed OLED Encapsulation.

Zhuo Gao1,2, Songju Li2, Lei Wang1

  • 1State Key Laboratory of Luminescent Materials and Devices, Institute of Polymer Optoelectronic Materials and Devices, South China University of Technology, Guangzhou 510640, China.

Materials (Basel, Switzerland)
|February 13, 2026
PubMed
Summary
This summary is machine-generated.

Filtered cathodic vacuum arc (FCVA) technology significantly boosts Al2O3 deposition rates for flexible electronics. This high-rate, hydrogen-free process enhances oxide thin-film transistor stability and OLED device lifetime.

Keywords:
filtered cathodic vacuum arc depositioninkjet printingreliabilitythin-film encapsulation

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Area of Science:

  • Materials Science
  • Thin Film Technology
  • Electronics Packaging

Background:

  • Atomic Layer Deposition (ALD) suffers from low deposition rates, limiting its application in high-throughput manufacturing.
  • Conventional ALD processes may introduce hydrogen, potentially compromising the stability of oxide thin-film transistors (TFTs).
  • Effective encapsulation is crucial for the performance and longevity of flexible electronic devices, particularly OLEDs.

Purpose of the Study:

  • To develop a high-rate deposition method for Al2O3 films using Filtered Cathodic Vacuum Arc (FCVA) technology.
  • To evaluate the suitability of FCVA-Al2O3 films for hybrid thin-film encapsulation (TFE) of OLEDs.
  • To assess the impact of FCVA-based TFE on the performance and reliability of oxide TFTs and OLED devices.

Main Methods:

  • Introduced FCVA technology for high-rate Al2O3 deposition, achieving 15 nm/min.
  • Fabricated hybrid TFE structures by integrating FCVA-Al2O3 with inkjet-printed organic layers.
  • Evaluated barrier properties (WVTR, surface roughness, residual stress) and device performance (TFT electrical characteristics, OLED efficiency, lifetime).

Main Results:

  • FCVA-Al2O3 deposition rate is approximately ten times higher than conventional ALD.
  • The hydrogen-free FCVA process ensures high stability for oxide TFT backplanes.
  • The hybrid TFE exhibited excellent water vapor barrier properties (WVTR of 1.2 × 10^-4 g/m^2/day).
  • Oxide TFT electrical properties showed no significant degradation after encapsulation.
  • OLED devices encapsulated with FCVA-Al2O3 demonstrated a lifetime of 300 hours under accelerated aging, nearly double that of unencapsulated devices.

Conclusions:

  • FCVA technology offers a high-throughput, high-performance solution for Al2O3 film deposition.
  • FCVA-based hybrid TFE provides excellent barrier properties suitable for flexible electronics.
  • FCVA technology enhances the reliability and lifetime of OLED devices without compromising TFT performance.