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Updated: Feb 15, 2026

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Pulse duration dependence of nonlinear absorption in dielectric thin film coatings under UV irradiation
Abstract:
This study investigates the temporal absorption behavior of single-layer HfO2, SiO2, and anti-reflective HfO2/SiO2 dielectric coatings under ultraviolet irradiation at 343 nm and 355 nm wavelengths, as a function of laser pulse duration ranging from 170 fs to 10 ps. Absorptance was measured using photothermal common-path interferometry and analyzed with rate equation-based numerical models. The results revealed that classical multiphoton absorption alone cannot fully account for the observed temporal absorptance dynamics. A simplified model indicated that absorption via intermediate defect states may significantly contribute to the nonlinear optical response, depending on both the pulse duration and the intrinsic material properties.
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