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Nonmonotonic Roughness Evolution in Film Growth on Weakly Interacting Substrates.

Dmitry Lapkin1, Ismael S S Carrasco2,3, Catherine Cruz Luukkonen1

  • 1Eberhard Karls Universität Tübingen, Institut für Angewandte Physik, Auf der Morgenstelle 10, 72076 Tübingen, Germany.

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|March 6, 2026
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Summary
This summary is machine-generated.

Thin film deposition on weakly interacting substrates shows a unique rough-to-smooth growth mode. This phenomenon, observed for different molecular geometries, can be controlled to manage nanoscale film roughness.

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Area of Science:

  • Materials Science
  • Surface Science
  • Nanotechnology

Background:

  • Thin film deposition on weakly interacting substrates often leads to complex growth patterns.
  • Initial island formation and increasing roughness are characteristic of these systems.
  • A subsequent decrease in roughness, leading to a smooth film, is a less understood phenomenon.

Purpose of the Study:

  • To experimentally demonstrate the rough-to-smooth growth mode in thin film deposition.
  • To explain the underlying mechanisms of this growth mode using a geometrical model.
  • To validate the generic nature of this phenomenon through kinetic Monte Carlo simulations.

Main Methods:

  • Experimental thin film deposition of buckminsterfullerene (C60) and 1,4,5,8,9,11-hexaazatriphenylenehexacarbonitrile.
  • Development of a geometrical model for multilayer island growth and coalescence.
  • Kinetic Monte Carlo simulations incorporating adsorbate-adsorbate and adsorbate-substrate interactions.

Main Results:

  • The rough-to-smooth growth mode was experimentally confirmed for both spherical (C60) and disk-like molecules.
  • The geometrical model accurately describes island growth, coalescence, and continuous film formation.
  • Kinetic Monte Carlo simulations showed this mode is general for weakly interacting substrates.

Conclusions:

  • The rough-to-smooth growth mode is a generic phenomenon in thin film deposition on weakly interacting substrates.
  • The study provides a framework for controlling nanoscale film roughness.
  • Understanding these mechanisms allows for tailored film properties independent of specific molecular details.