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Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
Published on: January 4, 2016
Visualizing carrier dynamics of a semiconductor film photodetector optimized by interface passivation
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To enhance photodetector performance, transient absorption (TA) microscopy is employed for the first time, to the best of our knowledge, to investigate carrier diffusion in interface-passivated semiconductor polycrystalline films. TA analysis reveals that after passivation with DMMI-Cl, the carrier diffusion length in MASnBr3 polycrystalline films increases from 109 nm to 123 nm, while the diffusion coefficient improves from 0.119 cm2 s-1 to 0.151 cm2 s-1. Furthermore, DMMI-Cl passivation suppresses carrier losses from monomolecular and Auger recombination and promotes bimolecular recombination. The resulting photodetector exhibits a nearly six-fold enhancement in responsivity (R = 4.09 AW-1), giving it a strong standing among reported 3D hybrid Sn-based perovskite photodetectors. This work expands the application scope of TA microscopy, provides deeper insight into grain-boundary-modulated spatiotemporal carrier dynamics, and contributes significantly to the development of high-performance tin-based photodetectors.
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