Trade-Off Between Surface Roughness and Crystallographic Orientation in Copper Electrodeposition via...

High-frequency 5G/6G communications demand copper foils combining sub-micron surface roughness (R_z < 0.6 μm) to minimize the skin effect with (111)-preferred orientation (for electromigration resistance), a balance challenging to achieve in conventional electrodeposition. This study quantifies the synergistic mechanism of a systematic series of additive formulations-from unary sodium 3-mercapto-1-propanesulfonate (MPS) to a quaternary MPS + polyethylene glycol (PEG) + Cl^- + gelatin (GEL) formulation-using electrochemical and microstructural analyses. While the ternary MPS + PEG + Cl^- system induced severe surface roughening (R_q = 449.5 nm) due to competitive adsorption, the introduction of high-concentration gelatin induced a kinetic bifurcation. It established a distinct "High-N/Low-D" regime-characterized by a 10⁴-fold reduction in diffusion coupled with a 10³-fold enhancement in nucleation, effectively suppressing the growth, reducing roughness from ~449.5 nm to ~81.3 nm via robust steric hindrance. However, this isotropic suppression simultaneously inhibited preferential crystal growth, leading to texture randomization. These findings kinetically quantify the intrinsic trade-off between extreme surface planarization and crystallographic orientation, providing a theoretical framework for designing high-performance interconnect materials.