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Optical color structuring via DALP-fabricated thin-film interference cavities in ZnO/SiO2 on Si
Optics Express
|March 18, 2026
Summary
We developed a new method using direct atomic layer processing (DALP) to create tunable structural colors on silicon. This technique allows for rapid prototyping of vibrant, spatially controlled color filters without lithography.
Area of Science:
- Materials Science
- Optics
- Nanotechnology
Background:
- Structural colors offer vibrant hues via physical structures, not pigments.
- Existing fabrication methods can be complex and time-consuming.
- Thin-film interference is a key principle for generating structural colors.
Purpose of the Study:
- To present a novel method for generating structural colors using direct atomic layer processing (DALP).
- To fabricate tunable interference cavities for precise color control.
- To enable fast prototyping of spatially controlled structural color filters.
Main Methods:
- Fabrication of ZnO/SiO2 thin-film interference cavities on silicon using DALP.
- Local deposition of successive layers to precisely control ZnO thickness (few nm to 150 nm).
- Optical characterization and rigorous coupled-wave analysis (RCWA) simulations to predict and validate reflectance spectra.
Main Results:
- Achieved tunable reflective colors through controlled depth modulation of ZnO layers.
- Demonstrated vivid hues generated by asymmetric interference cavities via optical interference.
- RCWA simulations accurately predicted experimental reflectance spectra, validated by CIE 1931 color mapping.
Conclusions:
- DALP is an effective, lithography-free technique for fabricating structural color filters.
- The method allows for precise spatial control over color generation.
- Enables rapid prototyping of custom structural color applications.
