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Algorithm prediction of lifetime under high-power microwave based on T-type field plate HEMTs
Mengwei Su1, Hongxia Liu1, Dong Xing1
1School of Microelectronic, Xidian University, Xi'an 710068, People's Republic of China.
Nanotechnology
|March 20, 2026
Summary
A new deep learning model accurately predicts the reliability and lifetime of high electron mobility transistors (HEMT) under high-power microwave (HPM) stress, outperforming traditional methods with minimal error.
Area of Science:
- Semiconductor Device Physics
- Machine Learning Applications
- Reliability Engineering
Background:
- High electron mobility transistors (HEMT) are crucial for high-power microwave (HPM) applications.
- Predicting HEMT device lifetime under HPM stress is vital for system reliability.
- Traditional methods often lack accuracy and efficiency in lifetime prediction.
Purpose of the Study:
- To develop a deep learning model for predicting HEMT device lifetime under HPM stress.
- To evaluate the performance of the deep learning model against traditional machine learning techniques.
- To establish a data-driven approach for assessing HPM reliability in HEMT devices.
Main Methods:
- Construction of a deep learning algorithm network model.
- Simulation of HPM stress effects on HEMT using TCAD technology.
- Comparative analysis with Support Vector Machine, Decision Tree, K-NN, Ridge, and Linear Regression.
Main Results:
- The deep learning model achieved a relative prediction error percentage below 15%, with most values under 5%.
- The deep learning algorithm demonstrated superior performance compared to five traditional machine learning methods.
- The model provides a data-driven tool for understanding HPM reliability and device lifetime.
Conclusions:
- Deep learning offers a highly accurate and efficient method for predicting HEMT device lifetime under HPM stress.
- The developed model can assist researchers in quickly obtaining device lifetime data and aid in device design.
- This approach signifies a broad future prospect for deep learning in semiconductor device reliability prediction.

