Image-based modeling of individual far-field resistance in cochlear implant recipients

Benjamin Bircher1, Stephan Schraivogel1, Philipp Aebischer1

  • 1ARTORG Center for Biomedical Engineering, University of Bern, Bern, Switzerland; Department of Otorhinolaryngology, Inselspital, Bern University Hospital, Bern, Switzerland.

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