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A 6-18 GHz High-Efficiency GaN Power Amplifier Using Transistor Stacking and Reactive Matching
Cetian Wang1,2, Xuejie Liao2,3, Moquan Gong3
1School of Microelectronics, Northwestern Polytechnical University, Xi'an 710129, China.
Micromachines
|March 28, 2026
Summary
This study details a 6-18 GHz Gallium Nitride (GaN) monolithic microwave integrated circuit (MMIC) power amplifier (PA). The GaN MMIC PA achieves high power and efficiency using advanced transistor stacking and multi-cell combination techniques.
Area of Science:
- Electrical Engineering
- Materials Science
- Semiconductor Physics
Background:
- Gallium Nitride (GaN) High Electron Mobility Transistors (HEMTs) are crucial for high-frequency power amplification.
- Designing wideband power amplifiers (PAs) with simultaneous high power and efficiency remains a significant challenge.
- Monolithic Microwave Integrated Circuits (MMICs) offer miniaturization and improved performance for RF applications.
Purpose of the Study:
- To design and implement a wideband GaN MMIC power amplifier (PA) operating from 6-18 GHz.
- To achieve high output power and high power-added efficiency (PAE) over the specified frequency range.
- To demonstrate the effectiveness of transistor stacking and multi-cell combination techniques in PA design.
Main Methods:
- Utilized a two-stage cascaded reactive matching network structure.
- Employed transistor stacking technology to enhance circuit gain.
- Implemented a multi-cell combination in the final stage for high power and efficiency.
- Fabricated a prototype GaN MMIC PA using a 0.1 µm GaN-on-Si HEMT process.
Main Results:
- Achieved a small signal gain ranging from 25-29 dB across the 6-18 GHz band.
- Delivered an output power between 40.8-42.5 dBm.
- Obtained a power-added efficiency (PAE) of 27-38% within the operating frequency range.
- The fabricated prototype measured 4.5 × 3.4 mm².
Conclusions:
- The designed GaN MMIC PA effectively meets the 6-18 GHz wideband requirements.
- The employed design techniques successfully achieved high power and high efficiency simultaneously.
- The results validate the potential of GaN-on-Si HEMT technology for advanced RF power amplifier applications.
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