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Published on: December 21, 2015
A low-toxicity ammonium hydrogen fluoride-based etchant for bonding pretreatment of silica-based CAD-CAM materials
Ayako Miura1,2, Yuya Komagata1, Yuki Nagamatsu1
1Division of Biomaterials, Kyushu Dental University.
Abstract:
This study aimed to develop a low-toxicity etchant for bonding pretreatment of silica-based CAD-CAM materials. An experimental etchant was prepared by combining ammonium hydrogen fluoride (AHF) with ammonium hydrogen sulfate (AHS) and subsequently optimized. The optimized AHF/AHS etchant was evaluated on lithium disilicate glass, feldspathic porcelain, polymer-infiltrated ceramic network, and resin composite, and compared with hydrofluoric acid (HF), a commercial etchant (Monobond Etch & Prime; MEP), and alumina sandblasting. For lithium disilicate glass, shear bond strength (SBS) obtained with AHF/AHS treatment was higher than that with MEP but lower than that with HF. For feldspathic porcelain and polymer-infiltrated ceramic network, SBS obtained with AHF/AHS was comparable to those obtained with HF. For resin composite, SBS obtained with AHF/AHS was higher than that with untreated control while lower than that with sandblasting. Cytotoxicity evaluated using human gingival fibroblasts showed IC50 values comparable to those of phosphoric acid and sodium fluoride.

