Strain Field Modulation in Suspended Graphene Membranes Using Localized Electron-Beam-Induced Deposition

In atomically thin membranes, strain couples strongly to electrons, phonons, and photons. Although strain originating from uniform or global deformation has been widely studied, the impact of spatially localized mechanical perturbations on strain distribution remains less explored. Here, we investigate how localized tungsten carbide deposition via focused electron-beam-induced deposition (FEBID) modifies the strain landscape in suspended monolayer graphene membranes. Using spatially resolved mechanical resonance mode shape mapping and Raman spectroscopy, supported by finite element simulations, we find that the central deposit acts as a mechanically coupled local perturbation that redistributes the pre-existing strain into a more radially symmetric configuration with reduced angular anisotropy around the deposit. These findings demonstrate that FEBID-based local deposition can serve as a lithography-free approach for controlled strain modulation in suspended graphene, offering a practical platform for studying strain-coupled phenomena and designing strain-controlled nanoelectromechanical and optoelectronic systems.