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Volatile Heteroleptic Molybdenum Complexes: Synthesis, Structure, and Thermal Properties
Sung Kwang Lee1,2, Ji Yeon Ryu1, Bo Keun Park1
1Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea.
Inorganic Chemistry
|June 6, 2026
Summary
New molybdenum complexes were synthesized to overcome limitations of traditional precursors for thin film deposition. Complex 4 shows potential as a vapor-phase deposition precursor for molybdenum-containing films.
Area of Science:
- Materials Science
- Inorganic Chemistry
- Thin Film Deposition
Background:
- Molybdenum (Mo)-based thin films are crucial for microelectronics and catalysis.
- Existing precursors like molybdenum hexacarbonyl (Mo(CO)6) have drawbacks due to carbonyl groups.
- Developing novel precursors is essential for high-quality thin film fabrication.
Purpose of the Study:
- To synthesize new heteroleptic molybdenum complexes with improved properties.
- To overcome the disadvantages associated with carbonyl ligands in Mo(CO)6.
- To identify a suitable precursor for vapor-phase deposition of molybdenum-containing thin films.
Main Methods:
- Synthesis of new molybdenum complexes using Mo(η3-allyl)(CO)2(MeCN)2Cl and tridentate-NNO ligands.
- Characterization via Fourier transform infrared spectroscopy (FT-IR), elemental analysis (EA), and single crystal X-ray diffraction.
- Thermal analysis using thermogravimetric analysis (TGA) and vapor pressure analysis.
Main Results:
- Seven new heteroleptic molybdenum complexes were successfully synthesized.
- Complex 4, Mo(crotyl)(CO)2(demamp), exhibited suitable vapor pressure for deposition applications.
- Characterization confirmed the structure and properties of the synthesized complexes.
Conclusions:
- The synthesized molybdenum complexes offer potential alternatives to Mo(CO)6.
- Complex 4 is identified as a promising precursor for vapor-phase deposition of molybdenum thin films.
- This research contributes to the advancement of materials for microelectronics and catalysis.
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