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Related Experiment Video

Updated: Jun 12, 2026

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
07:39

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Published on: July 21, 2018

High-aspect-ratio plasmonic lithography via decaying feature amplification.

Chuang Wu, Dandan Han, Yayi Wei

    Optics Express
    |June 11, 2026
    PubMed
    Summary
    This summary is machine-generated.

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    This study introduces a metamaterial photoresist resonance cavity (MPRC) to enhance plasmonic lithography. The MPRC overcomes shallow imaging depth and poor patterning fidelity, enabling high-aspect-ratio nanomanufacturing.

    Area of Science:

    • Nanotechnology
    • Optics
    • Materials Science

    Background:

    • Plasmonic lithography uses surface plasmon polaritons (SPPs) for sub-diffraction imaging.
    • Challenges include shallow imaging depth and poor patterning fidelity due to evanescent wave decay.
    • These limitations hinder nanoscale applications.

    Purpose of the Study:

    • To develop a novel structure for enhanced plasmonic lithography.
    • To overcome limitations of conventional photoresist plasmonic lithography (CPPL).
    • To enable high-aspect-ratio nanomanufacturing with improved patterning fidelity.

    Main Methods:

    • Engineered a metamaterial photoresist resonance cavity (MPRC) structure.
    • Embedded a periodic silver nanosphere array within the photoresist (PR) layer to excite localized surface plasmon resonance (LSPR).

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    Last Updated: Jun 12, 2026

    Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
    07:39

    Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

    Published on: July 21, 2018

    Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters
    10:54

    Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters

    Published on: July 8, 2013

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    09:33

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  • Utilized cascaded coupling of SPPs and LSPR to form double catenary fields for evanescent wave amplification.

    • Main Results:

    • Achieved a patterning depth of at least 72 nm with an aspect ratio exceeding 1.0.
    • Maintained high pattern fidelity, significantly outperforming CPPL.
    • Demonstrated enhanced imaging transfer capability by reducing high-k information loss.

    Conclusions:

    • The MPRC structure effectively amplifies evanescent wave decay.
    • This approach provides a fundamental and practical pathway for high-aspect-ratio nanomanufacturing.
    • MPRC offers a significant advancement over traditional plasmonic lithography techniques.