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Updated: Jun 12, 2026

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Stitch-Less Lithography Empowered by Multi-Dimensional Holography.

Hsin-Hui Huang1,2,3, Haoran Mu1,3, Eulalia Puig Vilardell4,5

  • 1Optical Sciences Centre, Swinburne University of Technology, Melbourne, VIC 3122, Australia.

Nanomaterials (Basel, Switzerland)
|June 11, 2026
PubMed
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This summary is machine-generated.

Future micro- and nano-lithography for large-area electronics and solar cells will leverage direct laser writing and 3D fabrication. Real-time feedback via 3D-capable holography is key for stitch-free, large-area patterning.

Area of Science:

  • Materials Science and Engineering
  • Nanotechnology
  • Optics and Photonics

Background:

  • Advancements in micro- and nano-lithography are crucial for next-generation large-area applications, including high-packing-density electronics and solar cells.
  • Current lithographic techniques face challenges in achieving high resolution and scalability for complex 3D structures over large areas.

Purpose of the Study:

  • To survey and outline trends in micro- and nano-lithography for future large-area applications.
  • To present strategies for direct laser writing of etch masks over large areas.
  • To discuss the extension of 2D and 2.5D fabrication methods into 3D micro- and nano-fabrication.

Main Methods:

  • Direct laser writing strategies: fixed beam moving stage and moving beam moving stage approaches for etch mask definition.
Keywords:
3Ddiffraction limitfeature sizemicrofabricationresolutionstitching-less lithographythreshold effect

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  • Extension of planar 2D and stacked 2D (2.5D) fabrication techniques to 3D micro- and nano-fabrication.
  • Implementation of 3D-capable holography for real-time feedback in lithographic exposure control, wavefront sensing, and adaptive feedback.

    • Main Results:

    • Demonstrated strategies for large-area etch mask definition using direct laser writing.
    • Exploration of 3D micro- and nano-fabrication pathways extending from 2D and 2.5D methods.
    • Identification of real-time feedback capability via 3D-capable holography as essential for future 3D nanolithography.

    Conclusions:

    • Future micro-fabrication will be characterized by highly specialized 3D architecture design and reduced post-processing steps.
    • 3D-capable holography offers a pathway to stitch-free, large-area 3D patterning, overcoming limitations of current methods.
    • The integration of advanced lithographic techniques and real-time feedback is critical for advancing large-area electronic and solar cell technologies.