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Updated: Jun 13, 2026

Large Area Substrate-Based Nanofabrication of Controllable and Customizable Gold Nanoparticles Via Capped Dewetting
Published on: February 26, 2019
High-Concentration Gold Nanoparticle Pastes for Advanced Deposition-Based Sensor Manufacturing
Aleksandra Motyka1,2, Sławomir Drozdek1,3, Nina Szczotka1,4
1XTPL SA, Legnicka 48E, 54-202 Wrocław, Poland.
Abstract:
There is a growing demand for extreme miniaturization and enhanced sensitivity in next-generation sensing systems, including wearable devices and bioelectronics. Such advanced platforms require highly conductive, biocompatible, and mechanically robust architectures capable of conforming to dynamic surfaces. Conventional metallic thin-film fabrication techniques have reached their fundamental physicochemical limits, often suffering from suboptimal mechanical strength, complex multi-step processing, and high costs. In contrast, additive manufacturing methodologies offer streamlined microfabrication, yet traditional printing methods frequently struggle with low-viscosity constraints, insufficient metal loading, and significant material losses. This paper covers the morphological fidelity, mechanical resilience, and electrical performance of rheologically tailored, high-concentration (above 90%) gold nanoparticle paste deposited via Ultra-Precise Dispensing (UPD) technology. The capability of the UPD system to print complex, high-density fractal geometries with linewidths down to 5 μm is evaluated on both rigid and flexible substrates, glass and polyimide, respectively. The mechanical structural integrity of these conductive traces is characterized under initial 360-degree bending tests. Finally, the electrical stability and thermal response of a printed proof-of-concept temperature sensor are evaluated. The printed fractal microstructures exhibit good resolution and the fabricated sensor demonstrates good stability, displaying a linear thermal response with a temperature coefficient of resistance of 1.98·10-3 °C-1, validating this combined material-deposition approach for microelectronics.

