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Published on: December 16, 2013
Ultrasonic-Assisted Silanization of SiO2 Using TMSPM: Surface Functionalization, Hydrophobicity Enhancement, and
Warlinda Eka Triastuti1, Sumarno1, Suprapto2
1Department of Chemical Engineering, Faculty of Industrial Technology and Systems Engineering, Institut Teknologi Sepuluh Nopember, Surabaya 60111, Indonesia.
None:
This study investigates the structural and chemical changes occurring upon ultrasonic-assisted silanization of SiO2 nanoparticles. While traditional silanization often faces challenges in grafting uniformity, the application of ultrasonication in this work facilitates enhanced interfacial contact and rapid functionalization with 3-(trimethoxysilyl)-propyl methacrylate (TMSPM). The concentration of TMSPM was varied to evaluate correlation between TMSPM concentration gradients, grafting density, and particle size of silanized SiO2 under ultrasonic conditions. FTIR analysis confirmed the successful chemical bonding of TMSPM, evidenced by the intensified Si-O-Si absorption bands and the distinct appearance of methacrylate carbonyl groups. The results indicated that 10% TMSPM can be considered the most effective concentration for SiO2 silanization, as indicated by the substantial increase in carbon content of 31% via EDS analysis and a maximum water contact angle of 128°. This significant shift from hydrophilic to hydrophobic behavior demonstrates the effectiveness of the ultrasonic-assisted approach in producing high-quality, silanized silica fillers. Furthermore, XRD analysis revealed that while the fundamental amorphous structure of SiO2 is preserved, the modification process introduces subtle changes in the short-range structural order of the nanoparticles.
