Scalable Fabrication of 4 nm Silicon Nanopores by Self-Limiting Metal-Assisted Chemical Etching Combined with Optical

Fabio De Ferrari1, Alessandro Enrico2, Chrysovalantou V Leva1

  • 1Department of Micro and Nanosystems, KTH Royal Institute of Technology, Malvinas väg 10, Stockholm 100 44, Sweden.

Related Concept Videos