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Related Experiment Video

Updated: Jun 27, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

High-Precision LCCD-Based Focus Metrology for I-Line Lithography: Multi-Sample Repeatability and Adaptability

Hengrui Guan^1,2, Xinxin Zhao^1,2, Yuheng Chu^1,2

¹Graduate School of Science Island, University of Science and Technology of China, Hefei 230026, China.

|June 26, 2026

Summary

This summary is machine-generated.

This study shows a linear charge-coupled device (LCCD) metrology system achieves stable focus-height measurement repeatability across diverse I-line lithography materials. The system

Keywords:

I-line inspection LCCD-based focus metrology local focus-height measurement material-surface adaptability repeatability semiconductor metrology

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Area of Science:

Optical Metrology
Semiconductor Manufacturing

Background:

Accurate focus-height measurement is critical for I-line lithography inspection.
Sub-micrometer height variations impact imaging, exposure, and autofocus performance.

Purpose of the Study:

Evaluate the local focus-height repeatability of an LCCD-based system.
Assess performance across various I-line lithography related material surfaces.

Main Methods:

Developed a prototype LCCD focus metrology system with LED illumination and telecentric optics.
Employed a two-step localization procedure: template matching and centroid estimation.
Tested on silicon, GaAs, sapphire, infrared transmissive material, and SiC.

Main Results:

Achieved peak-to-valley repeatability of 35-37 nm for highly reflective samples.
Measured 40-54 nm repeatability for intermediate/low-reflectivity and microstructured samples.
All results were below the 70 nm engineering criterion.

Conclusions:

The LCCD measurement system demonstrated stable local repeatability across tested material surfaces.
Results support the development of local focus metrology for precision optical inspection.
The system is suitable for I-line lithography applications.