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Published on: October 23, 2018
Effects of Dielectric Interlayer on Polarization Switching and Rectifying Characteristics in Al0.8Sc0.2N/HfO2
Jong Min Park1, Hyeong Jun Joo1, Yoojin Lim1
1Department of Intelligent Semiconductor, Soongsil University, Seoul 06938, Republic of Korea.
None:
Ferroelectric (FE) diodes configured in the metal-ferroelectric-metal (MIFM) structure are promising candidates for non-volatile memory. While recent studies emphasized bulk FE properties, interfacial characteristics have not been carefully considered. In this work, we investigate the HfO2/Al0.8Sc0.2N interface by examining its impact on switching and rectifying characteristics in MIFM FE diodes with variable HfO2 thicknesses (2/4/6 nm). Electrical characterization reveal that the increased HfO2 thickness raises the coercive field (EC) due to enhanced electrostatic effects and progressive interfacial oxidation from Sc-N to Sc-O bonds. This resulting oxygen substitutional defect (ON) which may contribute to domain-wall pinning and reduced rectifying efficiency. Cycling tests clarify operating regime-dependent phenomena, including ON redistribution-induced wake-up and eventual breakdown. Moreover, enhanced retention is observed after pre-cycling, originating from the stabilization of the interfacial defects rather than bulk properties. These findings underscore that EC and device reliability are likely influenced by interfacial engineering, which is critical for the reliable operation of AlScN-based FE diodes.
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