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Updated: Jul 2, 2026

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Fabrication and Characterization of Superconducting Resonators
Published on: May 21, 2016
Superconducting NbN Resonator Parametric Amplifiers for Millimetre Wavelengths
Songyuan Zhao1, S Withington1, C N Thomas2
1Clarendon Laboratory, Parks Road, Oxford, OX1 3PU UK.
Summary
We developed a new sputtering process for high-temperature superconducting Niobium Nitride (NbN) films. These films are ideal for kinetic inductance parametric amplifiers, offering high gain and efficiency across the millimetre-wave spectrum.
Area of Science:
- Materials Science
- Superconductivity
- Microwave Engineering
Background:
- High critical temperature (Tc) superconducting films are crucial for sensitive detectors and amplifiers.
- Niobium Nitride (NbN) is a promising material for superconducting devices due to its high Tc and critical magnetic field.
- Kinetic inductance parametric amplifiers require specific film properties, including high normal-state resistivity, for optimal performance.
Purpose of the Study:
- To develop a reactive sputtering process for fabricating high Tc NbN thin films with tailored high normal-state resistivity.
- To optimize the sputtering conditions for achieving full nitridation of the NbN target.
- To evaluate the performance of NbN films in resonator parametric amplifiers.
Main Methods:
- Reactive sputtering deposition with precise control over target nitridation.
- Characterization of NbN thin films, including critical temperature (Tc) and normal-state resistivity measurements.
- Fabrication and testing of coplanar waveguide resonator parametric amplifiers using the developed NbN films.
Main Results:
- Achieved NbN thin films with a critical temperature (Tc) of 10.5 K and resistivity of ~1000 μΩ cm.
- Demonstrated the potential for application across the millimetre-wave frequency range (24-300 GHz).
- Fabricated parametric amplifiers exhibiting high gain (>20 dB) at 25 GHz with reproducible amplification profiles.
Conclusions:
- The developed reactive sputtering process enables the fabrication of high-quality NbN films suitable for kinetic inductance parametric amplifiers.
- The high Tc and resistivity of the NbN films facilitate efficient operation of parametric amplifiers with reduced pump tone power.
- The fabricated devices show excellent performance, validating the potential of these NbN films for advanced microwave applications.
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