Dynamic evolution and mechanism of calcium fluoride crystal degradation under X-ray irradiation
Abstract:
The degradation of calcium fluoride (CaF2) crystals in deep ultraviolet (DUV) lithography systems poses a critical challenge to the safe and stable operation of such systems. Understanding the degradation dynamics and underlying physical mechanisms induced by high-energy photon irradiation is essential for improving the radiation resistance of CaF2 crystals. This work proposes a rapid assessment method for evaluating the radiation-resistant lifetime of CaF2 crystals based on X-ray exposure. By characterizing the dynamic degradation behavior of CaF2 crystals under various X-ray doses and integrating multidimensional defect characterization techniques, the physical mechanism of X-ray-induced degradation was systematically elucidated, with dislocation density identified as the dominant factor governing the radiation resistance of CaF2 crystals. This study not only elucidates the dynamic evolution and critical factors of degradation processes in CaF2 crystals under X-ray irradiation but also lays a solid foundation for the future optimization of their radiation-resistant properties in high-energy radiation environments.
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