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Published on: December 27, 2012
MOF-Derived FeNi/C Composites Constructed by Controlled Etching for High-Performance Electromagnetic Wave Absorption
Lvtong Duan1, Jinkai Jia1, Junchen Liu1
1College of Materials Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing, China.
Advanced Materials (Deerfield Beach, Fla.)
|July 9, 2026
Summary
New electromagnetic wave absorption (EWA) materials offer a green solution to electronic device pollution. Researchers engineered FeNi/C composites from Co-MOF precursors, achieving a 7.13 GHz absorption bandwidth at 1.97 mm thickness.
Area of Science:
- Materials Science
- Nanotechnology
- Electromagnetics
Background:
- Growing electronic devices increase electromagnetic wave pollution.
- Electromagnetic wave absorption (EWA) materials convert electromagnetic energy to thermal energy.
- High-performance EWA requires balancing impedance matching and energy dissipation via microstructural control.
Purpose of the Study:
- To develop high-performance EWA materials with controllable microstructures.
- To elucidate the mechanism of structural evolution and electronic state modulation during material synthesis.
- To establish a structure-performance correlation for rational absorber design.
Main Methods:
- Utilized cobalt-based metal-organic frameworks (Co-MOF) as precursors.
- Regulated Ni2+ and Fe3+ content to control structural evolution and electronic states during etching.
- Employed in situ competitive coordination and etching-competitive coordination systems.
- Combined Density Functional Theory (DFT), COMSOL, and CST simulations for mechanistic elucidation.
Main Results:
- Achieved synergistic regulation across atomic, nanoscale, and microscale levels.
- Developed FeNi/C composite with an effective absorption bandwidth of 7.13 GHz at an ultrathin thickness of 1.97 mm.
- Elucidated the role of etching engineering in enhancing EWA performance from multiple perspectives.
Conclusions:
- The study provides a method for controllable synthesis of high-performance EWA materials.
- Etching engineering is crucial for optimizing EWA properties by modulating material structure and electronic states.
- The findings offer a theoretical basis for designing advanced electromagnetic wave absorbers.
