A beam-direction cross-vessel metrology method and error analysis for the ptychography setup at HEPS ID09

Area of Science:

• X-ray science
• Metrology
• Nanotechnology

Background:

• Ptychography is a powerful imaging technique requiring precise sample positioning.
• Existing metrology methods may not meet the stringent stability requirements for advanced synchrotron facilities like the High Energy Photon Source (HEPS).

Purpose of the Study:

• To propose and validate a novel metrology method for precise position monitoring and correction in the HEPS beamline ID09 ptychography setup.
• To demonstrate the effectiveness of an Invar interferometer frame for achieving high positional stability.

Main Methods:

• Development of a compact Invar interferometer metrology frame designed for the space constraints of the HEPS beamline.
• Detailed description of the measurement methodology and rigorous error analysis.
• Implementation and testing of the metrology system within the ptychography setup.

Main Results:

• The developed metrology system achieved exceptional positional stability of less than 2 nm RMS over a frequency range of 1 Hz to 500 Hz.
• Successful demonstration of the metrology strategy through 2D ptychography reconstruction with a resolution of 12.3 nm at 12.4 keV.

Conclusions:

• The proposed Invar interferometer metrology method is effective for high-precision position monitoring and correction in synchrotron-based ptychography.
• The achieved stability and resolution confirm the viability of this strategy for advanced imaging applications at HEPS.