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A beam-direction cross-vessel metrology method and error analysis for the ptychography setup at HEPS ID09
Ruiying Liao1, Zina Ou1, Haihan Yu1,2
1Multidisciplinary Research Center, Institute of High Energy Physics of the Chinese Academy of Sciences, Beijing, People's Republic of China.
None:
A metrology method dedicated to position monitoring and correction for the ptychography setup at the High Energy Photon Source (HEPS, Beijing, China) beamline ID09 is proposed. The sophisticated design of the Invar interferometer metrology frame ensures optimal performance within the compact environment between the focal spot and the sample setup. The measurement method and error analysis are described in detail. The sample setup achieves a positional stability of less than 2 nm RMS from 1 Hz to 500 Hz. The 12.3 nm reconstruction resolution of 2D ptychography at 12.4 keV demonstrates that the interferometer metrology strategy is available.
