Toward Higher Fatigue Resistance of Photochromic Polymer Layers Containing Novel Diarylethenes
Mattes Plieth1, André Eitzeroth2, Henrik Hercht1
1Institute of Organic Chemistry, Clausthal University of Technology, Leibnizstr. 6, 38678 Clausthal-Zellerfeld, Germany.
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For the use of diarylethenes (DAE) in optical microscopy with the aim of overcoming the Abbe limit, interdependent parameters must be coordinated. These include, in particular, the fatigue resistance X A , the position of the isosbestic points (λisos > 400 nm), and the molar extinction coefficients of the closed form (εclosed > 20,000 L/mol·cm). Thirteen photoswitchable DAEs were prepared and spectroscopically characterized (λ isos , ε closed , quantum yields φ), among those a first example of a pyridazine substituted derivative. The spectroscopic properties of the closed form of known and hitherto unknown DAEs can be predicted using the spectroscopic Hammett equation, since the excitation energy differences E T,R - E T,H/2.303·R·T correlate linearly with the Hammett parameters σp. Matrix effects of eight different polymers in the spin-coated absorbance modulation layer (AML) on the properties of model DAEs were investigated. A correlation was found between the glass transition temperature T g and the degradation rate of the photochrome. We found that replacing PMMA with ZEONEX480R results in a 3-fold increase in photostability. DFT calculations of the frontier orbital profiles of the DAEs as well as the changes in the geometric requirements of the 6π-electrocyclic ring closure provide insights into structure-property relationships.
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