Organic Nanolayers for Stress Relief at Inorganic Interfaces

Anoop Kumar Kushwaha1,2, D M Saaduzzaman2, Rajan Khadka2

  • 1Center for Materials, Devices and Integrated Systems, Rensselaer Polytechnic Institute, Troy, New York12180-3522, USA.

Summary

A novel molecular nanolayer (MNL) strategy relieves stress in inorganic thin films by controlled debonding and reformation. This approach enhances material stability and opens new avenues for interface engineering in nanomaterials.

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