Scale-resolved silicon deposition in a jacketed silane reactor
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Updated: Nov 5, 2026
Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices
Published on: October 6, 2020
Lu Qin1, Jiyi Zhu2, Yanzhe Gai1,3
1Frontiers Science Center for Transformative Molecules, School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China. yidezhi@sjtu.edu.cn.
Abstract:
Matched-basis steady-RANS simulations separate single-rod axial nonuniformity from full-reactor rod-to-rod maldistribution in a jacketed silane reactor. Feed/exhaust topology strongly redistributes rod deposition at a fixed precursor throughput, while the apparent cooling-jacket-radius response depends materially on the feed basis. The reduced chemistry is interpreted only within its configured scope.
