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Applying X-ray Imaging Crystal Spectroscopy for Use as a High Temperature Plasma Diagnostic
Published on: August 25, 2016
Flash X-ray microscopy with a gas jet plasma source
Journal of Microscopy
|September 1, 1984
Abstract:
A novel flash X-ray source, the gas jet plasma source, has been used for contact X-ray microscopy. Using a wavelength range of 2-7 nm a resolution of the order of 30 nm can be obtained. The gas jet plasma source provides a new and unique tool which should allow future imaging of wet live cells.
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