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Fabrication of submicrometer features on curved substrates by microcontact printing
R J Jackman1, J L Wilbur, G M Whitesides
1Department of Chemistry, Harvard University, Cambridge, MA 02138, USA.
Science (New York, N.Y.)
|August 4, 1995
Abstract:
Microcontact printing (mu CP) has been used to produce patterned self-assembled monolayers (SAMs) with submicrometer features on curved substrates with radii of curvature as small as 25 micrometers. Wet-chemical etching that uses the patterned SAMs as resists transfers the patterns formed by mu CP into gold. At present, there is no comparable method for microfabrication on curved surfaces.