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Spontaneous N,N'-dibutylurea (DBU) formation in Benlate DF formulation under elevated temperatures
1Department of Environmental Biochemistry, College of Tropical Agriculture and Human Resources, University of Hawaii, Honolulu 96822, USA.
Archives of Environmental Contamination and Toxicology
|March 1, 1996
Summary
High temperatures cause the fungicide Benlate DF to degrade, forming N,N'-dibutylurea (DBU). This DBU formation enhances the fungicide's phytotoxicity, especially in warm climates.
Area of Science:
- Agricultural Chemistry
- Environmental Science
- Plant Pathology
Background:
- Benlate DF is a fungicide formulation containing benomyl.
- Thermal degradation can alter the chemical composition and efficacy of pesticides.
- Understanding pesticide stability under various environmental conditions is crucial for agricultural safety and effectiveness.
Purpose of the Study:
- To investigate the thermal degradation products of benomyl in Benlate DF.
- To determine the role of formulation ingredients in degradation.
- To assess the impact of degradation on fungicide phytotoxicity.
Main Methods:
- Analysis of Benlate DF samples subjected to elevated temperatures (above 55°C and 70°C).
- Identification of degradation products using chemical analysis.
- Lettuce seedling bioassay to evaluate phytotoxicity of heat-treated fungicide.
Main Results:
- Thermal degradation of benomyl in Benlate DF above 55°C produces N,N -dibutylurea (DBU).
- Starch within the formulation acts as an internal water source, facilitating degradation without external moisture.
- Heat-treated Benlate DF with accumulated DBU showed enhanced phytotoxicity in lettuce bioassays.
- DBU accumulation was confirmed in samples stored in a hot shipping container in Hawaii.
Conclusions:
- DBU formation is an inherent property of Benlate DF under thermal stress.
- High temperatures and humidity, common in tropical regions, create optimal conditions for DBU formation.
- The degradation process can lead to increased phytotoxicity, potentially impacting agricultural applications.