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Andrew V Teplyakov

Showing results (1-10 of 49) with videos related to

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The Journal of Chemical Physics|February 10, 2017
Deposition of copper from Cu(i) and Cu(ii) precursors onto HOPG surface: Role of surface defects and choice of a precursorYichen Duan, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|August 24, 2018
29,31- H Phthalocyanine Covalently Bonded Directly to a Si(111) Surface Retains Its Metalation AbilityChuan He, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|October 26, 2012
Silicon surface functionalization targeting Si-N linkagesFangyuan Tian, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|December 19, 2007
Adsorption of C60 buckminster fullerenes on an 11-amino-1-undecene-covered Si(111) substrateXiaochun Zhang, Andrew V Teplyakov
The Journal of Physical Chemistry. B|March 11, 2006
Vinyltrimethylsilane (VTMS) as a probe of chemical reactivity of a TiCN diffusion barrier-covered silicon surfaceLaurent Pirolli, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|April 17, 2014
Attachment chemistry of PCBM to a primary-amine-terminated organic monolayer on a Si(111) surfaceTimothy Miller, Andrew V Teplyakov
The Journal of Physical Chemistry. B|July 21, 2006
Complex thermal chemistry of vinyltrimethylsilane on Si(100)-2x1Laurent Pirolli, Andrew V Teplyakov
Accounts of Chemical Research|July 18, 2023
Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry ConsiderationsAlfredo Mameli, Andrew V Teplyakov
Journal of the American Chemical Society|June 12, 2003
Spectroscopic evidence for hydrogen diffusion through a several-nanometers-thick titanium carbonitride layer on siliconSemyon Bocharov, Andrew V Teplyakov
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|November 9, 2016
Dehydrohalogenation Condensation Reaction of Phenylhydrazine with Cl-Terminated Si(111) SurfacesFei Gao, Andrew V Teplyakov
Pageof 5

Showing results (1-10 of 49) with videos related to

Sort By:
Pageof 5
The Journal of Chemical Physics|February 10, 2017
Deposition of copper from Cu(i) and Cu(ii) precursors onto HOPG surface: Role of surface defects and choice of a precursorYichen Duan, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|August 24, 2018
29,31- H Phthalocyanine Covalently Bonded Directly to a Si(111) Surface Retains Its Metalation AbilityChuan He, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|October 26, 2012
Silicon surface functionalization targeting Si-N linkagesFangyuan Tian, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|December 19, 2007
Adsorption of C60 buckminster fullerenes on an 11-amino-1-undecene-covered Si(111) substrateXiaochun Zhang, Andrew V Teplyakov
The Journal of Physical Chemistry. B|March 11, 2006
Vinyltrimethylsilane (VTMS) as a probe of chemical reactivity of a TiCN diffusion barrier-covered silicon surfaceLaurent Pirolli, Andrew V Teplyakov
Langmuir : the ACS Journal of Surfaces and Colloids|April 17, 2014
Attachment chemistry of PCBM to a primary-amine-terminated organic monolayer on a Si(111) surfaceTimothy Miller, Andrew V Teplyakov
The Journal of Physical Chemistry. B|July 21, 2006
Complex thermal chemistry of vinyltrimethylsilane on Si(100)-2x1Laurent Pirolli, Andrew V Teplyakov
Accounts of Chemical Research|July 18, 2023
Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry ConsiderationsAlfredo Mameli, Andrew V Teplyakov
Journal of the American Chemical Society|June 12, 2003
Spectroscopic evidence for hydrogen diffusion through a several-nanometers-thick titanium carbonitride layer on siliconSemyon Bocharov, Andrew V Teplyakov
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|November 9, 2016
Dehydrohalogenation Condensation Reaction of Phenylhydrazine with Cl-Terminated Si(111) SurfacesFei Gao, Andrew V Teplyakov
Pageof 5