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ACS Applied Materials & Interfaces|February 26, 2026
Fluorocarbon-Free Hierarchical Slippery Copper Surfaces via Solid-State Electrochemical EtchingAtsuki Tsuji, Junji MurataACS Applied Materials & Interfaces|February 27, 2025
Soft Copper Nanoimprinting via Solid-State Electrochemical Etching for Flexible OptoelectronicsAtsuki Tsuji, Taizo Kobayashi, Junji MurataSmall Methods|March 1, 2024
Ultrafast Solid-State Electrochemical Imprinting Utilizing Polymer Electrolyte Membrane Stamps for Static/Dynamic Structural Coloration and Letter EncryptionKatsuma Yamazaki, Atsuki Tsuji, Masaru Takizawa, et al.Nanoscale|September 30, 2024
Solid-state electrochemical oxidation with polyelectrolyte membrane stamps for micro-/nanoscale pattern formation on Au surfacesTatsuya Fujii, Atsuki Tsuji, Masaru Takizawa, et al.Journal of Nanoscience and Nanotechnology|July 23, 2011
Efficient wet etching of GaN (0001) substrate with subsurface damage layerShun Sadakuni, Junji Murata, Keita Yagi, et al.Journal of Nanoscience and Nanotechnology|July 23, 2011
Improved optical and electrical characteristics of free-standing GaN substrates by chemical polishing utilizing photo-electrochemical methodJunji Murata, Yuki Shirasawa, Yasuhisa Sano, et al.Journal of Nanoscience and Nanotechnology|July 23, 2011
Dependence of process characteristics on atomic-step density in catalyst-referred etching of 4H-SiC(0001) surfaceTakeshi Okamoto, Yasuhisa Sano, Kazuma Tachibana, et al.Journal of Nanoscience and Nanotechnology|July 23, 2011
Structure and magnetic properties of mono- and bi-layer graphene films on ultraprecision figured 4H-SiC(0001) surfacesAzusa N Hattori, Takeshi Okamoto, Shun Sadakuni, et al.Pageof 1